Continuous Improvements and Future Challenges of Air Pollution Control at an Advanced Semiconductor Fab
نویسندگان
چکیده
This study reviews the air pollution control strategy at an advanced semiconductor fab focusing on its continuous improvements and future challenges. A wide range of pollutants is emitted from various sources classified as organic solvents, corrosive, toxic combustible gases. effective employs a two-stage treatment method to comply with national emission regulations. Eight different types local scrubbers (typ. gas flow rate: 0.3–2.0 CMM for dry type or 60–83.3 wet type) are used pre-treatment devices first stage remove specific target high concentrations process chambers. Exhaust gases then grouped further treated by central facilities second stage, including dual zeolite rotor-concentrator plus thermal oxidizer VOCs 2500 CMM), dual-central (CWS) alkaline CWS 2000 CMM) acid gases, respectively. After treatment, removal efficiency can reach higher than 98.4%, surpassing standard 90%. The design parameters operating conditions CWSs meet criteria set in industry. In future, performance be improved using structured packing materials larger surface areas shorten residence time lower chemical dosing amount pressure drop while achieving reduced cost. challenges removing derived fine PM white smoke still remain which resolved efficient pre- post-treatment stages, such electrostatic precipitators. Finally, by-product NOx minimized low-NOx burners de-NOx technologies future.
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ژورنال
عنوان ژورنال: Aerosol and Air Quality Research
سال: 2023
ISSN: ['2071-1409', '1680-8584']
DOI: https://doi.org/10.4209/aaqr.230034